2011 SEMICON China, BILLERICA, USA: Entegris Inc. announced that it will showcase its latest solutions for semiconductor and LED manufacturers at the 2011 SEMICON China event this week at the Shanghai New International Expo Center.
To meet LED manufacturers' increasing need for more improved production, Entegris will demonstrate how its new Ultrapak 150 mm Thick Wafer Shipper and Aeronex® gas purification systems can help manufacturers improve yields by enhancing and preserving wafer integrity.
The Ultrapak 150 mm Thick Wafer Shipper is designed for shipping the 1.3 mm thick wafers commonly used in LED chip manufacturing. This polypropylene shipper secures wafers to limit rotation, reduce particle contamination and prevent damage or breakage.
"Through collaboration with leading LED manufacturers, Entegris identified key modifications for its widely-used semiconductor shipper that ideally suit the unique needs of the LED industry," said William Shaner, vice president and general manager for Entegris' Microenvironments Division. "We combined their input with more than 30 years of Entegris' wafer shipping experience to design the most protective shipper for these critical substrates."
Specific modifications include improving wafer spacing and pitch to fit wafers that are thicker than standard silicon wafers. The design also features a new secondary packaging system to support and protect the heavier load. The new shipper expands Entegris' current line of LED wafer handling products which includes a multiple wafer shipper for thin wafers, single wafer shippers and multiple wafer carriers used for in-fab processing.
In addition to the Ultrapak shipper, Entegris will be showing its Aeronex line of gas purification solutions for High Brightness LED (HBLED) manufacturing applications. These systems provide reliable gas purification for maximum uptime, enabling manufacturers to produce HBLEDs with the highest photoluminescence peaks and luminous efficiencies. The multi-bed design allows continuous supply of purified gas and is available in several flow ranges for nitrogen, hydrogen and ammonia.