Wednesday, July 13, 2011

ESI unveils LED wafer scribing system for high volume, ultra high brightness LED manufacturing

SEMICON West 2011, PORTLAND, USA: ESI Inc., a leading supplier of innovative laser-based manufacturing solutions for the microtechnology industry, unveiled its most advanced LED wafer scribing system, the AccuScribe 2600.

ESI’s AccuScribe 2600 is built on patented, industry-leading technology enabling customers to extract the maximum light output from LED’s. ESI developed the AccuScribe 2600 based on customer requirements for high brightness LED (HB-LED) manufacturing, including Patterned Sapphire Substrate (PSS), Distributed Bragg Reflector (DBR), Metal Mirror (MM) and other advanced light extraction technologies. The company is showcasing the AccuScribe 2600 this week at the SEMICON® West exhibition in San Francisco.

“ESI pioneered the laser scribing of LED wafers with our patented technology for LED sapphire substrates,” said Jonathan Sabol, general manager of ESI’s LED µEngineering Division. “Industry wide expansion of high brightness LEDs is driving rapid changes in LED architecture and manufacturing processes to continuously increase lumens/watt. The AccuScribe 2600 is specifically designed to match our customers’ most demanding technology roadmaps while achieving industry best yield, performance and cost.”

Multiple customers have recently confirmed that the AccuScribe 2600 delivers the industry’s highest brightness scribing for a wide range of HB-LED technologies including PSS and DBR metal mirror. Increased light output results in increased revenue and profitability for LED Manufacturers.

This, coupled with achieving the highest yield, lowest cost, least environmental impact, and complete elimination of the employee work hazards related to chemical etching, will allow ESI Accuscribe 2600 customers to lead in the most profitable segment of the high brightness LED market.

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